A Novel Approach to Pulse Anodizing for Decreasing Energy Consumption and Increasing Productivity
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Keller F., Hunterand M.S., Robinson D.L. J. Electrochem. Soc. 1953; 100: 411p.
Henly V.F. Anodicoxidation of Aluminum and its Alloys. Pergamon Press, Oxford. 1982. Martin CR. Chem. Mater. 1996; 8: 1739p.
a) Su Z.X., Sha J., Pan G.W., et al. J. Phys. Chem. B. 2006; 110: 1229p.
b) Fu J., Cherevko S., Chung C.H. Electrochem. Commun. 2008; 10: 514p.
Masuda H., Fukuda K. Science. 1995; 268: 1466p.
Ono S., Saito M., Asoh H. Electrochem, Solid-State Lett. 2004; 7: B21p.
Jessensky O., Muller F., Gosele U. Appl. Phys. Lett. 1998; 72: 1173p.
Singh G.K., Golovin A.A., Aranson I.S. Phys. Rev. B. 2006; 73: 205422p.
Kanagaraj D., Vincent S., Narasimhan V.L. Bull. Electrochem. 1989; 5: 513p.
Miller M.A. U.S. Patent. 2,920,018. 1960.
Raj V., Rajaram M.P., Balasubramanian G., et al. Trans. Inst. Met Finish. 2003; 81: 114p.
Yokoyama K., Konno H., Takahashi H., et al. Plat. Surf. Finish. 1982; 69: 62p.
Lee W., Schwirn K., Steinhart M., et al. Nature Nanotech. 2008; 3: 234p.
Wernick S., Pinner R., Sheasby P.G. The Surface Treatment and Finishing of Aluminum and its Alloys. 5th Edn. Finshing Publications Ltd. Teddington, Middlesex, England. 1987.
Serebrennikova I., Vanýsek P., Birss V.I. Characterization of Porous Aluminum Oxide Films by Metal Electrodeposition. Electrochimica Acta. 1997; 42(1): 145–51p.
Bengough G.D., Stuart J.M. British Patent, 223,994. 1923.
Bengough G.D., Stuart J.M. British Patent, 223,995. 1923.
Gower C.H.R., Beren S.O. British Patent, 290,901. 1927.
Kujirai T., Ueki S. US Patent, 1,735,509. 1926.
Djozan D., Amir-Zehni M. Surf. Coat. Tech. 2003; 173: 185–91p.
Miller M.A. US Patent, 2,920,018, 1960.
The Scionics Corp. Northridge, Calif. US Patent, 3,708,407, 1970.
Permaloy Corp. Ogden, Utah. US Patent, 3,857,766. 1972.
Poll G.H. Prod. Fin. 1972; 36(6): 84–9p.
Chuo Seisakusho K.K. Jap. Patent, 51/4032. 1974.
Chuo Seisakusho K.K. Jap. Patent, 51/4034. 1974.
Kondo M., Kitagawa M., Takahashi T. Japan Kokai. 77 88,553. 1977.
Kondo M., Takahashi T. Japan Kokai, 77 88,233. 1977.
Sugiyama N., Sato T., Takahashi M., et al. Jap. Tokyo Koho. 79 14,581. 1979.
Okubo K. J. Met. Fin. Soc. Japan. 33, 219. 1982.
Chuo Seisako Ltd. Jap. Tokyo Koho JP. 82, 26, 357, 1982.
Scheineder H.G., Marx G., Krysmann W., et al. Exp. Tech. Phys. 1982; 30(2): 179p.
Kanagaraj D., Narasimhan V.L., Vincent S., et al. Bull. Electrochem. 1986; 2: 597p.
Columbini C. Trans. Inst. Met. Fin. 1988; 66: 142p.
Columbini C. Galvanotechnic. 1994; 85: 790p.
Juhl A.D., Benzon M.E., Moeller P. Proc. AESF 83rd Annual Tech. Conf. 1996; 859p.
Rasmussen J. US Patent, 6, 113, 770. 2000.
Wen Y. Diandu Yu Huanbao. 2000; 20: 30p.
Murphy J.F., Michelson C.E. Conference on Anodizing of Aluminium, ADA, Nottingham, 1961.
Kazuo I., Akio F., Kazuhiko T. Inst. Phys. Chem. Res. 1962; 38: 635p.
Murdock Inc. US Patent, 3, 418, 222. 1968.
Takahashi T., Saitoh J. Plat. Sur. Fin. 1977; 64(7): 36p.
Orlov B.P., Lel`kora L.V., Zh. Mash R. 1980; 11B: 196p.
Baba N., Mizuki I. Advanced Metal Finishing Technology in Japan. 1980; 87p.
Yokoyama K., Konno H., Takahashi H., et al. Plat. Surf. Fin. 1982; 69(7): 63p.
Mita I., Miazawa K. J. Met. Fin. Soc. Japan. 1982; 33: 165p.
Matsushita Electric Industrial Co. Ltd. US Patent, 4,671, 858. 1984.
Huang HJ. Proc. Nat. Sci. Council Republ. China, Part A, Phys. Sci. Eng. 1985; 9(1): 5p.
Mita I., Kenkyu Hokoku, Tokyo-Toritsu Kogyo Gijutsu Senta. 1988; 18: 69p. Mita I, Miyasaka H. Kuzoka Hyomen Gijutsu. 1988; 39(6): 323p.
Okubo K., Toba S., Sakura Y. J. Met. Fin. Soc. Japan. 1988; 39(9): 512p.
Okubo K., Sakura Y. J. Met. Fin. Soc. Japan. 1988; 39(11): 751p.
Okubo K., Suyama S., Sakura Hyomen Gijutsu Y. 1989; 40: 579p.
Okubo K., Suyama S., Sakura Y. J. Surf. Fin. Soc. Japan. 1989; 40: 1366p.
Azzouz N., Belmokre K., Pagetti J. Entropie. 1997; 33: 207p.
Sakairi M., Ohira Y., Takahashi H. Proc. Electrochem. Soc. 1998; 97(26): 643p.
Kanagaraj D., Vincent S., Raj V., et al. J. Electrochem. Soc. India. 1999; 48: 222p.
Kanagaraj D. Ph.D Thesis, Alagappa University, Karaikudi. 2000.
Shih H.H., Tzou S.L. Surf. Coat. Technol. 2000; 124: 278p.
Kanagaraj D., Raj V., Vincent S., et al. Bull. Electrochem. 2001; 17: 28p.
Kanagaraj D., Raj V., Vincent S., et al. Bull. Electrochem. 2001; 17: 523p.
Mohan S., Kanagaraj D., Raj V, et al. Proc. Electrochem. Soc. 2001; (4): 579
Woo Lee, Jae-CheonKim. Nanotechnology. 2010; 21: 485304(8p).
Wood G.C., O´ Sullivan J.P. The Anodizing of Aluminum in Sulphate Solutions. Electrochemica Acto. Pergamon Press. 1970; 15: 1865–76p.
Summary from a Meeting with Dr. Nagayama, Mr. Yokoyama in 1989 at The Technical University of Denmark, Institut of Product Development.
Rasmussen J. Surface Treatment with Pulse Current. PhD. Thesis, Inst. of Manufacturing Engineering, The Technical University of Denmark, Dec 1994.
Thompson G.E., Xu Y., Skeldon P., et al. Anodic Oxidation of Aluminum. Philosohical Magazinee B. 1987; 55(6): 651p.
Anderson S. Mechanism of Electrolytic Oxidation of Aluminum. J. Appl. Phys. 1944; 15: 477p.
Hoar T.P., Mott N.F. A Mechanism for the Formation of Porous Anodic Oxide Films on Aluminum. J. Phys. Chem. Solids. 1959; 9: 97p.
Takahashi H., Nagayama M., Akahori H., et al. Electron-Microscopy of Porous Anodic Oxide Films on Aluminum by Ultra-thin Sectioning Technique, Part I. J. Electron Microsc. 1973; 22(2): 149p.
Xu Y., Thompson G.E., Wood G.C. Mechanism of Anodic Film Growth on Aluminum. Trans. Inst. of Metal Finishing. 1985; 63: 98p.
Keller F., Hunter M.S., Robinson D.L. Structural Features of Oxide Coatings on Aluminum. J. Electrochem. Soc.1953; 100(9).
Yokoyama K., Konno H., Takahashi H., et al. Anodic Oxidation of Aluminum Utilizing Current Recovery Effect. AES, 2nd. International Symposium on Pulse Plating, Rosemont, I, USA. Oct 6–7, 1981.
Colombini C. The Use of Pulse Rectifiers for Aluminum Anodizing. Finishing. 1988; 12(1): 34p.
Diggle J.W., Downie T.C., Goulding CW. Anodic Oxide Films on Aluminum. Chem. Rev. 1969; 69: 365p.
Raj V., Rajaram M.P., Balasubramanian G., et al. Trans. Inst. Met Finish. 2003; 81: 114p.
Lee W., Ji R., Gosele U., et al. Nat. Mater. 2006; 5: 741p.
Schwirn K., Lee W., Hillebrand R., et al. ACS Nano. 2008; 2: 302p.
Lee W., Nielsch K., Gosele U. Nanotechnology. 2007; 18: 475713
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